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Jefferson Laboratory, Center for Injectors and Sources | Jefferson Laboratory, Center for Injectors and Sources | ||
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[[File:GroupPhoto_July2014.jpeg|thumb|center|600px|alt=Group Photo.|CIS members are (l to r) Matt Poelker (Group Leader), Joe Grames, Bubba Bullard, Marcy Stutzman, John Hansknecht, Shukui Zhang, Carlos Hernandez-Garcia, Phil Adderley, Riad Suleiman.]] | [[File:GroupPhoto_July2014.jpeg|thumb|center|600px|alt=Group Photo.|CIS members are (l to r) Matt Poelker (Group Leader), Joe Grames, Bubba Bullard, Marcy Stutzman, John Hansknecht, Shukui Zhang, Carlos Hernandez-Garcia, Phil Adderley, Riad Suleiman.]] | ||
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Mission: To develop and maintain high performance beam sources and injectors for particle accelerators. Our primary responsibility is the operation of a highly spin-polarized (>85%) electron photo-injector for the CEBAF accelerator. Additionally, our group is active in the R&D of very high voltage DC guns, high power RF synchronized lasers, extreme high vacuum, development of novel photocathode materials and precision electron beam polarimetry. | Mission: To develop and maintain high performance beam sources and injectors for particle accelerators. Our primary responsibility is the operation of a highly spin-polarized (>85%) electron photo-injector for the CEBAF accelerator. Additionally, our group is active in the R&D of very high voltage DC guns, high power RF synchronized lasers, extreme high vacuum, development of novel photocathode materials and precision electron beam polarimetry. | ||
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'''[[Contact Us]]''' | '''[[Contact Us]]''' |
Revision as of 07:49, 18 July 2014
Jefferson Laboratory, Center for Injectors and Sources
Mission: To develop and maintain high performance beam sources and injectors for particle accelerators. Our primary responsibility is the operation of a highly spin-polarized (>85%) electron photo-injector for the CEBAF accelerator. Additionally, our group is active in the R&D of very high voltage DC guns, high power RF synchronized lasers, extreme high vacuum, development of novel photocathode materials and precision electron beam polarimetry.