Difference between revisions of "Center for Injectors and Sources"
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[[Octal High Voltage Biasing Supply]] | [[Octal High Voltage Biasing Supply]] | ||
[[NanoAmmeter with up to 3kV isolation]] | [[NanoAmmeter with up to 3kV isolation]] | ||
| + | [[Biasing Supply with built in nano-ammeter]] | ||
[[Dual / Quad UHV Ion Pump Power Supplies]] | [[Dual / Quad UHV Ion Pump Power Supplies]] | ||
Revision as of 09:44, 30 September 2013
Our group develops and maintains the highly spin-polarized (>85%) electron photo-injector of the CEBAF accelerator at Jefferson Lab based upon photoemission from strained-superlattice gallium arsenide photocathodes. Our group is involved in the associated R&D of very high voltage DC guns, high power RF synchronized lasers, extreme high vacuum, novel photocathode materials and electron beam polarimetry.
About Us
Staff Students
Archival Area
Publications Conferences & Workshops Presentations Meetings Workspace
Operations and Research
Polarimeters Bubble Chamber
Custom Instrumentation Corner
Octal High Voltage Biasing Supply NanoAmmeter with up to 3kV isolation Biasing Supply with built in nano-ammeter Dual / Quad UHV Ion Pump Power Supplies
Helpful Links
Old CIS Homepage Jefferson Lab Homepage Electronic Logbooks Web On-Call