Difference between revisions of "Center for Injectors and Sources"
Jump to navigation
Jump to search
| Line 23: | Line 23: | ||
[[Octal High Voltage Biasing Supply]] | [[Octal High Voltage Biasing Supply]] | ||
[[NanoAmmeter with up to 3kV isolation]] | [[NanoAmmeter with up to 3kV isolation]] | ||
| + | [[Dual / Quad UHV Ion Pump Power Supplies]] | ||
== Helpful Links == | == Helpful Links == | ||
Revision as of 10:39, 30 September 2013
Our group develops and maintains the highly spin-polarized (>85%) electron photo-injector of the CEBAF accelerator at Jefferson Lab based upon photoemission from strained-superlattice gallium arsenide photocathodes. Our group is involved in the associated R&D of very high voltage DC guns, high power RF synchronized lasers, extreme high vacuum, novel photocathode materials and electron beam polarimetry.
About Us
Staff Students
Archival Area
Publications Conferences & Workshops Presentations Meetings Workspace
Operations and Research
Polarimeters Bubble Chamber
Custom Instrumentation
Octal High Voltage Biasing Supply NanoAmmeter with up to 3kV isolation Dual / Quad UHV Ion Pump Power Supplies
Helpful Links
Old CIS Homepage Jefferson Lab Homepage Electronic Logbooks Web On-Call