Difference between revisions of "Electrical Area"

From Ciswikidb
Jump to navigation Jump to search
(12 intermediate revisions by 2 users not shown)
Line 1: Line 1:
 
== Custom Instrumentation & Controls ==
 
== Custom Instrumentation & Controls ==
[[Octal High Voltage Biasing Supply]]
+
 
[[NanoAmmeter with up to 3kV isolation]]
 
[[Biasing Supply with built in nano-ammeter]]
 
[[Dual / Quad UHV Ion Pump Power Supplies]]
 
 
  [[Matsusada Wein Filter Power supplies 2018]]
 
  [[Matsusada Wein Filter Power supplies 2018]]
 
  [[SCAM macropulse controller used at CEBAF GTS and UITF]]
 
  [[SCAM macropulse controller used at CEBAF GTS and UITF]]
Line 11: Line 8:
 
  [[PSS laser shutters]]
 
  [[PSS laser shutters]]
 
  UITF Laser interlocks  [[ITF_interlock]]
 
  UITF Laser interlocks  [[ITF_interlock]]
 +
UITF Laser table cross connects  [[ITF_laser xconn]]
 +
[[UITF Glassman 450KV power supply circuits]]
 +
[[Gain-switched laser seed information]]
 +
Quad Servo Driver (for optics in/out control) [[Media:quadservo.pdf]]
 +
[[Quad IA system]]
 +
[[Pockels Cell Opto Drivers]]
 +
[[UITF dipole interlocks]]
 +
[[CEBAF injector cross connects]]
 +
[[UHV ion pump power supplies]]
 +
[[CEBAF GLASSMAN 450KV POWER SUPPLY CIRCUITS]]
 +
[[A1 Aperture Motor Control]]
 +
[[Port Server Info]]
 +
[[UITF Motor Controls]]

Revision as of 13:04, 25 September 2020